Scanning electron microscope with FIB – Zeiss Crossbeam 1540
Focused Ion Beam Crossbeam – Zeiss
- Cross Beam 1540Esb FIB Workstation including In Lens-, SE-, ESB-, QBSD-detector
- Field emission ion source
- Oxford INCA Energy 350 EDX
- HKL system with four diode forescatter detector
- Gas injection system (platinum & tungsten deposition; etching gas (fluor))
- Kleindiek micromanipulator for in-situ lift-out of lamellas
- MEMS force sensor for micromechanical testing
The Zeiss Crossbeam 1540 is equiped with a field emission ion source and a Ga ion gun to locally remove material in a very precise way. This ion milling process gives the opportunity to prepare cross sections and analyze them with different analytical methods (e.g. EDX, EBSD) to characterize the sample. This means damage cases and microstructural changes can be investigated properly. Furthermore a preparation of samples for transmission electron microcopy (TEM) is possible by a cutting and lift-out method using a micromanipulator to extract a specific sample volume. Further thinning by ion milling leads to foils which are thin enough for TEM or STEM analysis.
Verantwortliche Mitarbeiter:
Department of Materials Science and Engineering Department of Materials Science and Engineering Department of Materials Science and EngineeringOliver Nagel, M. Sc.
Chair of General Materials Properties
Dominik Steinacker
Chair of General Materials Properties
Christina Hasenest
Chair of General Materials Properties