PVD evaporation unit EVU-MSE-1

With the self-built evaporation unit called „EVU-MSE-1“ thin films can be deposited by physical vapour deposition. Two crucibles can be mounted between the copper electrodes with a maximum output of 210 A and 360 A, respectively. The deposition rate and the thickness are monitored by a quarz crystal microbalance. The substrate holder can rotate in two different speeds during the deposition to obtain a homogenious thickness in one run. Halogen lamps installed above the substrate holder control the substrate temperature and used to heat treat the samples directly after deposition without breaking the vacuum.

 

 

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